IBM at SPIE Advanced Lithography + Patterning 2025

SPIE ALP is the premier conference for patterning and metrology in semiconductors

IBM is proud to be a sponsor at SPIE Advanced Lithography + Patterning. We invite all attendees to visit us during the event at the San Jose McEnery Convention Center in San Jose, CA. We look forward to meeting you at the event and telling you more about our latest work and career opportunities at IBM Research.

At this year's SPIE Advanced Lithography + Patterning Symposium (2025), the IBM Semiconductors research team will present key innovations in the areas of EUV patterning performance, AI technology, inline metrology, and sustainability.   In the opening plenary sessions, Dr. Heike Riel, IBM Fellow and department head of Science & Technology in the IBM Zurich lab, will dive through the world of innovations in AI that IBM Research is driving.   With more than a dozen talks across the four-day symposium, each day contains multiple talks from IBM researchers, culminating in a talk in the late-breaking session on Thursday by Dr. Luciana Meli on IBM's latest breakthroughs on High NA EUV patterning.