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Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
Paper
A linear time approximation scheme for makespan minimization in an open shop with release dates
Abstract
The existence of a linear time approximation scheme for makespan minimization was demonstrated in the multiprocessor open shop problem with release dates. The approximation scheme was linear and didn't require solving linear program.
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