Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
In the present paper we discuss a mathematical model of fibrinolysis and show that it agrees with experimental evidence. We hope that such a model might ultimately serve as a basis for simplifying and speeding up certain clinical assays. © 1967.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Paul J. Steinhardt, P. Chaudhari
Journal of Computational Physics
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004