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Modeling polarization for Hyper-NA lithography tools and masks
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We present a rigorous framework, based on optimization, for evaluating data mining operations such as associations and clustering, in terms of their utility in decision-making. This framework leads quickly to some interesting computational problems related to sensitivity analysis, segmentation and the theory of games. © 1998 Kluwer Academic Publishers.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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