Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We study an uncapacitated facility location model where customers are served by facilities of level one, then each level one facility that is opened must be assigned to an opened facility of level two. We identify a polynomially solvable case, and study some valid inequalities and facets of the associated polytope. © 2014 EDP Sciences, ROADEF, SMAI, .
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Hendrik F. Hamann
InterPACK 2013
David S. Kung
DAC 1998
Michael C. McCord, Violetta Cavalli-Sforza
ACL 2007