Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We consider the travelling salesman problem (TSP) problem on (the metric completion of) 3-edge-connected cubic graphs. These graphs are interesting because of the connection between their optimal solutions and the subtour elimination LP relaxation. Our main result is an approximation algorithm better than the 3/2-approximation algorithm for TSP in general. © 2004 Elsevier B.V. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
David W. Jacobs, Daphna Weinshall, et al.
IEEE Transactions on Pattern Analysis and Machine Intelligence
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008