Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We consider the travelling salesman problem (TSP) problem on (the metric completion of) 3-edge-connected cubic graphs. These graphs are interesting because of the connection between their optimal solutions and the subtour elimination LP relaxation. Our main result is an approximation algorithm better than the 3/2-approximation algorithm for TSP in general. © 2004 Elsevier B.V. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Hannaneh Hajishirzi, Julia Hockenmaier, et al.
UAI 2011
Naga Ayachitula, Melissa Buco, et al.
SCC 2007
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990