Conference paperCharacterization of photoresist spatial resolution by interferometric lithographyJohn A. Hoffnagle, William D. Hinsberg, et al.Microlithography 2003
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PaperIrredundancy in circular arc graphsMartin Charles Golumbic, Renu C. LaskarDiscrete Applied Mathematics
Conference paperIntegration of polymer self-assembly for lithographic applicationJoy Y. Cheng, Daniel P. Sanders, et al.SPIE Advanced Lithography 2008
