Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Computer simulation of the change in the distribution of second‐phase particles, on stretching a phase‐separated glass with randomly dispersed second‐phase particles surrounded by a depleted region, indicated the development of a uniaxial anisotropy in distribution. The anisotropy, expressed by the ratio of the magnitude of directional components of nearest‐neighbor distances, indicated a maximum at an elongation ratio (final length/initial length) <2, decreasing at further elongation. This is qualitatively similar to the microstructural birefringence data by Thomas. The results further indicate that, the higher the particle density, the greater the maximum anisotropy appearing at the smaller elongation ratio. Copyright © 1982, Wiley Blackwell. All rights reserved
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials
R.W. Gammon, E. Courtens, et al.
Physical Review B