PaperCharacteristics of the annealing kinetics of tin films deposited at 88°KJ.R. Priest, C. Chiou, et al.Journal of Applied Physics
PaperFormation of thin film circuits using preferential nucleationH.L. Caswell, Y. BudoSolid-State Electronics
PaperInfluence of oxygen on the surface mobility of tin atoms in thin filmsH.L. Caswell, Y. BudoJournal of Applied Physics
PaperLow-temperature properties of evaporated lead filmsH.L. Caswell, J.R. Priest, et al.Journal of Applied Physics
