Skip to main content
Research
Focus areas
Blog
Publications
Careers
About
Back
Focus areas
Semiconductors
Artificial Intelligence
Quantum Computing
Hybrid Cloud
Back
About
Overview
Labs
People
Back
Semiconductors
Back
Artificial Intelligence
Back
Quantum Computing
Back
Hybrid Cloud
Back
Overview
Back
Labs
Back
People
Research
Focus areas
Semiconductors
Artificial Intelligence
Quantum Computing
Hybrid Cloud
Blog
Publications
Careers
About
Overview
Labs
People
Open IBM search field
Close
British Journal of Applied Physics
Paper
20 Nov 2002
Annealing of residual stress in silicon monoxide films [1]
View publication
Abstract
No abstract available.
Related
Paper
Superconducting properties of AuPb
3
and AuPb
2
Paper
Influence of oxygen on the surface mobility of tin atoms in thin films
Paper
Low-temperature properties of evaporated lead films
Paper
Stress Anisotropy in Silicon Oxide Films
View all publications
