Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
This paper introduces a generalization of totally monotone matrices, namely totally monotone partial matrices, shows how a number of problems in computational geometry can be reduced to the problem of finding the row maxima and minima in totally monotone partial matrices, and gives an O((m+nlog logn) algorithm for finding row maxima and minima in an n×m totally monotone partial matrix. In particular, if P and Q are nonintersecting n and m vertex convex polygons, respectively, our methods give an O((m+n)log logn) algorithm for finding for each vertex x of P, the farthest vertex of Q which is not visible to x, and the nearest vertex of Q which is not visible to x. © 1990.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
John A. Hoffnagle, William D. Hinsberg, et al.
Microlithography 2003
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
David L. Shealy, John A. Hoffnagle
SPIE Optical Engineering + Applications 2007