W. Knaepen, J. Demeulemeester, et al.
Microelectronic Engineering
The high flux and density of X-rays produced at synchrotrons provide the microelectronics industry with a powerful probe of the structure and behavior of a wide array of solid materials that are being developed for use in devices of the future. They also are of great use in determining why currently-used materials and processes sometimes fail. This paper describes the X20 X-ray beamline facility operated by IBM at the National Synchrotron Light Source, and presents a series of three industry challenges and results that illustrate the variety of techniques used and problems addressed. The value of this research ranges from solving short-term, technically specific problems to increasing our academic understanding of materials in general. Techniques discussed include high-resolution diffraction, time-resolved diffraction, texture measurements, and grazing-incidence diffraction. © 2005 Elsevier B.V. All rights reserved.
W. Knaepen, J. Demeulemeester, et al.
Microelectronic Engineering
Adam Pyzyna, Robert L. Bruce, et al.
VLSI Technology 2015
Rubab Ume, Haibo Gong, et al.
Journal of Applied Physics
M. Gaowei, E.M. Muller, et al.
Applied Physics Letters