Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
On GaAs (111) facets grown by a slider-free LPE technique, atomically flat areas and growth steps 6.5 Å high have been verified by the novel scanning tunneling microscopy. Nomarski interference contrast micrographs give a mean distance of the steps of 6 μm. These extremely flat and structurally perfect surfaces are thus nearly free of steps in contrast to surfaces and facets previously prepared. © 1982.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
I. Morgenstern, K.A. Müller, et al.
Physica B: Physics of Condensed Matter
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering