Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We prove that the automorphism group of a one-sided subshift of finite type is generated by elements of finite order. For one-sided full shifts we characterize the finite subgroups of the automorphism group. For one-sided subshifts of finite type we show that there are strong restrictions on the finite subgroups of the automorphism group. © 1990, Cambridge University Press. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Y.Y. Li, K.S. Leung, et al.
J Combin Optim
Michael E. Henderson
International Journal of Bifurcation and Chaos in Applied Sciences and Engineering