Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We consider the problem of when does a positive entropy topological system have a continuous factor with strictly smaller entropy. In many cases it is shown that such small entropy factors exist. On the other hand, classes of examples are given where differentiable factors must preserve some of the original entropy. © 1991, Cambridge University Press. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering
Shashanka Ubaru, Lior Horesh, et al.
Journal of Biomedical Informatics
John S. Lew
Mathematical Biosciences