Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Paper
Characteristics of Applications that Support Creativity
Abstract
No abstract available.
Related
Victor Valls, Panagiotis Promponas, et al.
IEEE Communications Magazine
Conference paper
QALD-3: Multilingual question answering over linked data
Elena Cabrio, Philipp Cimiano, et al.
CLEF 2013
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998