A. Reisman, M. Berkenblit, et al.
JES
The growth of superconducting oxides in vacuum conditions compatible with molecular beam epitaxy (MBE) requires a form of activated oxygen. The activated oxygen species can be either atomic oxygen (O) or ozone (03). Here we characterize a rf plasma source by measuring the oxidation rate of a silver film on a quartz crystal deposition monitor as a function of the oxygen flow. The initial oxidation rate provides a lower limit for the actual atomic oxygen flux. If the frequency change of the quartz signal is entirely due to the oxidation of silver by atomic oxygen and we assume a detection efficiency of one, then the total cracking efficiency of the source is. estimated to be around 30%. The source was used in a MBE machine to deposit thin (200 A) high-rcfilms of DyBa2Cu307 on SrTiQ3with a 7nsetof 88 K and a rfr0of 86 K. © 1992, American Vacuum Society. All rights reserved.
A. Reisman, M. Berkenblit, et al.
JES
Kenneth R. Carter, Robert D. Miller, et al.
Macromolecules
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
I. Morgenstern, K.A. Müller, et al.
Physica B: Physics of Condensed Matter