Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Chemical vapor deposition environments, while technologically quite important, are difficult to study using traditional analytical probes, such as electron-based techniques and optical tools. In this work, we will describe some of the ways in which X-rays can be applied to understand not only the gas phase composition through fluorescence, but also surface processes such as nucleation and diffusion. © 1995.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics