Solomon Assefa, Fengnian Xia, et al.
CLEO/QELS 2010
A compact waveguide-integrated Germanium-on-insulator (GOI) photodetector with 10 ± 2fF capacitance and operating at 40Gbps is demonstrated. Monolithic integration of thin single-crystalline Ge into frontend CMOS stack was achieved by rapid melt growth during source-drain implant activation anneal. ©2010 Optical Society of America.
Solomon Assefa, Fengnian Xia, et al.
CLEO/QELS 2010
Davood Shahrjerdi, Stephen W. Bedell
Nano Letters
Jie Gao, Felice Gesuele, et al.
QELS 2010
Yanqing Wu, Damon B. Farmer, et al.
Proceedings of the IEEE