Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We present an exact identity between the on-site and the extended s-wave pairing amplitudes in the Hubbard model. We prove that the extended s-wave pairing amplitude vanishes identically at half filling for both signs of U. Away from half filling, the existence of an on-site s-wave pairing is a necessary and sufficient condition for the existence of an extended s-wave pairing. This result gives rise to constraints on the possible symmetries of the superconducting gap in the Hubbard model. © 1990 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Mitsuru Ueda, Hideharu Mori, et al.
Journal of Polymer Science Part A: Polymer Chemistry
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering