Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This paper is concerned with the study of a general class of functional equations covering as special cases the relation which defines the up-function as well as equations which arise in multiresolution analysis for wavelet construction. We discuss various basic properties of solutions to these functional equations such as regularity, polynomial containment within the space spanned by their integer shifts and their computability by subdivision algorithms. © 1993 J.C. Baltzer AG, Science Publishers.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Laxmi Parida, Pier F. Palamara, et al.
BMC Bioinformatics
Chai Wah Wu
Linear Algebra and Its Applications
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004