Zhaoying Hu, George S. Tulevski, et al.
Applied Physics Letters
We describe a process for the growth of a single, electronically decoupled graphene layer on SiC(0001). The method involves annealing in disilane to (1) prepare flat, clean substrates, (2) grow a single graphene layer, and (3) electronically decouple the graphene from the substrate. This approach uses a single process gas, at μTorr pressures, with modest substrate temperatures, thus affecting a drastic simplification over other processes described in the literature. © 2014 AIP Publishing LLC.
Zhaoying Hu, George S. Tulevski, et al.
Applied Physics Letters
Chun Yung Sung, Yu-Ming Lin, et al.
VLSI-TSA 2010
Shu-Jen Han, Satoshi Oida, et al.
IEDM 2013
Kevin P. Weidkamp, Christina A. Hacker, et al.
Journal of Physical Chemistry B