MODEL SYSTEMS IN THE STUDY OF ETCHING MECHANISMS.
F.R. McFeely, J.F. Morar, et al.
Symposium on Plasma Processing 1986
Photoemission spectroscopy of spherosiloxane cluster derived Si/SiO x interfaces has allowed the direct assignment of observed spectral features to specific chemical moieties. The implications of these assignments for structural models of the Si/SiO2 interface are explored. Models specifically constructed to be consistent with photoemission data are shown to be incorrect after reanalysis of core-level shifts based on the recently synthesized model systems. A new model for the Si/SiO2 interface is proposed which is consistent with the current understanding of photoemission for Si/SiOx interfaces as well as with results from numerous other experiments.
F.R. McFeely, J.F. Morar, et al.
Symposium on Plasma Processing 1986
B. Cartier, M. Steen, et al.
VLSI Technology 2009
F.R. McFeely, J.A. Yarmoff, et al.
Surface Science
A.B. McLean, L.J. Terminello, et al.
Physical Review B