Conference paper
Top-surface-imaging resist for deep UV lithography
Scott A. MacDonald, H. Schlosser, et al.
International Technical Conference on Photopolymers 1991
The linear and nonlinear optical properties have been determined for a new organic nonlinear material 4-(N,N-dimethylamino)-3-acetamidonitrobenzene. Room-temperature angularly tuned type I phase matching for doubling of 1.064 μm radiation was achieved with a deff =27 pm/V. Favorable crystal growth habits were observed.
Scott A. MacDonald, H. Schlosser, et al.
International Technical Conference on Photopolymers 1991
Paul M. Lundquist, Ruediger Wortmann, et al.
Science
M. Stähelin, Cecilia A. Walsh, et al.
Journal of Applied Physics
R.J. Twieg, C.W. Dirk
The Journal of Chemical Physics