Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The structure and site-occupancy of the spinel-type MnCrInS4 was determined from powder diffraction data using synchrotron radiation (λ = 0.748Å) and the two-step method (integrated intensities determined by individual profile fittings followed by last-squares refinement). A Rietveld analysis was also done in order to check for the reliability of the method. The site-occupancy formula was [Mn0.75In0.25] [Cr0.5Mn0.12In0.38]2S4. © by R. Oldenbourg Verlag, München 1990
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Revanth Kodoru, Atanu Saha, et al.
arXiv
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP