Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Quantum wells of GaSb/InAs/GaSb have been prepared by molecular beam epitaxy (MBE) with emphasis on the correlation of the growth parameters with their electronic properties as characterized by magnetotransport measurements. An electron mobility of 3.5 × 105 cm2/V s has been obtained for the first time in the presence of holes. The holes disappear at a critical InAs thickness around 60 Å resulting from a semimetal-semiconductor transition. © 1986.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Mark W. Dowley
Solid State Communications
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990