Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Dilute solution properties of polystyrene and poly(α‐methylstyrene) in toluene have been measured using several of the commercially available instruments for intensity light scattering. Results are compared among the instruments used and with literature values. Relative advantages and disadvantages of the instruments are discussed. Copyright © 1991 John Wiley & Sons, Inc.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
J.K. Gimzewski, T.A. Jung, et al.
Surface Science