A. Reisman, M. Berkenblit, et al.
JES
Paper
Direct high-resolution excimer laser photoetching
Abstract
Direct high-resolution photoetching of various resists and polymers has been demonstrated using an ArF excimer laser at 193 nm. Features as small as 0.3 μm have been produced in 1 μm thick films with no subsequent wet processing steps necessary. © 1984 Springer-Verlag.
Related
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
B.A. Hutchins, T.N. Rhodin, et al.
Surface Science
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992