Paul H. Kasai, Vedantham Raman
Tribology Letters
It is postulated that the electron beam exposure process of the AZ-type resists (those containing diazoquinones as the labile component) is initiated by dissociative electron capture producing a phenoxy radical anion and N2. Na atoms and model diazoquinone molecules, l-oxo-2-diazonaphthoquinone, 2-oxo-l-diazonaphthoquinone, and o-diazo-benzoquinone, were cocondensed in argon matrices, and the Na-to-diazoquinone electron transfer was induced by mild radiation (λ > 580 nm). ESR examination of the matrices revealed that the three diazoquinones all readily captured low-energy electrons and dissociated to yield the respective phenoxy anion radicals resulting from N2 cleavage as postulated. © 1993, American Chemical Society. All rights reserved.
Paul H. Kasai, Vedantham Raman
Tribology Letters
John L. Dektar, Nigel P. Hacker
Journal of Organic Chemistry
Vinh Doan, Paul H. Kasai
Journal of Physical Chemistry A
George W. Tyndall, Nigel P. Hacker
Chemistry of Materials