Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Passage of a ~ 109 W/cm2 3470-Å mode-locked laser beam through a few torr of Cs vapor results in efficient parametric conversion of pump light into beams of ultrashort pulses at wavelengths located near the ~ 3600-Å 6s-9p and ~ 3900-Å 6s-8p Cs resonance lines. In addition, ultrashort pulses at roughly ten different infrared wavelengths lying between ~ 6 and 20 ε are produced. The four and six-wave parametric processes responsible for the conversion are initiated by stimulated electronic Raman emission. © 1973, IEEE. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
E. Burstein
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