Ellen J. Yoffa, David Adler
Physical Review B
Paper
Electrical Properties of AI/Ti Contact Metallurgy for VLSI Applications
Abstract
No abstract available.
Related
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
John G. Long, Peter C. Searson, et al.
JES