D. Lim, R. Haight
Journal of the Korean Physical Society
Using angle-resolved picosecond laser photoemission we have investigated both occupied and transiently excited empty states at the surface of Ge grown epitaxially on GaAs(110). We observe a normally unoccupied, Ge layer derived state whose separation from the valence-band maximum of the system is 700±50 meV at six monolayers Ge coverage. The evolution of the electronic structure is followed as a function of coverage and correlated with low-energy electron diffraction. The time dependence of the transiently occupied Ge signal is compared with that of the clean GaAs(110) surface and shows that electrons are <me;40p>prevented from diffusing into the GaAs bulk by the conduction-band offset of 330±40 meV.
D. Lim, R. Haight
Journal of the Korean Physical Society
R. Haight, D.R. Peale
Review of Scientific Instruments
R. Haight, J.A. Silberman, et al.
Proceedings of SPIE 1989
B. Langa, D. Sapkota, et al.
AIP Advances