Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We study a class of explicit or implicit multistep integration formulas for solving NXN systems of ordinary differential equations. The coefficients of these formulas are diagonal matrices of order N, depending on a diagonal matrix of parameters Q of the same order. By definition, the formulas considered here are exact with respect to y =-Dy + 4>(x, y) provided Q-hD, h is the integration step, and
1, the coefficients of the formulas are given explicitly as functions of Q. The present formulas are generalizations of the Adams methods (Q = 0) and of the backward differentiation formulas (Q). For arbitrary Q they are fitted exponentially at Q in a matricial sense. The implicit formulas are unconditionally fixed-ft stable. We give two different algorithmic implementations of the methods in question. The first is based on implicit formulas alone and utilizes the Newton Raphson method; it is well suited for stiff problems. The second implementation is a predictor-corrector approach. An error analysis is carried out for arbitrarily large Q. Finally, results of numerical test calculations are presented. © 1974, American Mathematical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
M. Tismenetsky
International Journal of Computer Mathematics
Paul J. Steinhardt, P. Chaudhari
Journal of Computational Physics