Conference paper
Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
We show that the semilattice extension problem raised by Arbib and Manes in [2] is NP-hard, implying that no simple solution is likely to be forthcoming. © 1983 Birkhäuser Verlag.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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