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SPIE Photomask Technology + EUV Lithography 2007
We show that the semilattice extension problem raised by Arbib and Manes in [2] is NP-hard, implying that no simple solution is likely to be forthcoming. © 1983 Birkhäuser Verlag.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
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