N.N. Negulyaev, V.S. Stepanyuk, et al.
Physical Review Letters
The fabrication of magnetic elements containing constrictions is demonstrated using nanostencil lithography in dynamic mode, i.e., by a continuous translation of a shadow mask with respect to the sample. The authors quantify the current resolution limits of this technique, demonstrating edge profile widths of 120 nm and thickness variations of 10%, and discuss prospects and challenges of dynamic nanostencil lithography. © 2007 American Institute of Physics.
N.N. Negulyaev, V.S. Stepanyuk, et al.
Physical Review Letters
J.K. Gimzewski, C. Joachim, et al.
Science
B. Reihl, J.K. Gimzewski, et al.
Physica B: Physics of Condensed Matter
R.R. Schlittler, J.W. Seo, et al.
Science