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Modeling polarization for Hyper-NA lithography tools and masks
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An algorithm is described which determines the median of n elements using in the worst case a number of comparisons asymptotic to 3n. © 1976 Academic Press, Inc.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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International Journal of Computer Mathematics
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Proceedings of SPIE - The International Society for Optical Engineering