Joseph M. Jasinski
Chemical Physics Letters
Mass spectrometric evidence is presented for the direct formation of gas-phase silyl radical, SiH3, as a product of the heterogeneous etching reaction of silicon films with hydrogen or deuterium atoms. © 1993.
Joseph M. Jasinski
Chemical Physics Letters
Joseph M. Jasinski, Stephen M. Gates
Accounts of Chemical Research
Joseph M. Jasinski
Journal of Physical Chemistry
Bernard S. Meyerson, Joseph M. Jasinski
Journal of Applied Physics