Conference paper
Evaluation of sSOI wafers for 22nm node and beyond
F. Allibert, Kangguo Cheng, et al.
S3S 2012
Fully depleted SOI (FDSOI) has become a viable technology not only for continued CMOS scaling to 22 nm node and beyond but also for improving the performances of legacy technology when retrofitting to old technology nodes. In this paper, we provide an overview of FDSOI technology, including the benefits and challenges in FDSOI design, manufacturing, and ecosystem. We articulate that FDSOI is potential cornerstone for China to catch up and leapfrog in semiconductor technology.
F. Allibert, Kangguo Cheng, et al.
S3S 2012
Sen Liu, Steven Holmes, et al.
SPIE Advanced Lithography 2013
Ali Khakifirooz, Kangguo Cheng, et al.
ISSCC 2010
Pranita Kulkarni, Q. Liu, et al.
SISPAD 2011