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SPIE Advanced Lithography 2010
A brief review is given of the near edge x-ray absorption fine structure (NEXAFS) and surface extended x-ray absorption fine structure (SEXAFS) techniques which have been developed in conjunction with the availability of high brightness monochromatic synchrotron radiation. Concepts and applications of the techniques are discussed using selected examples of chemisorption problems involving atoms and molecules on surfaces. Extensive references to related work are given. © 1985 Springer-Verlag.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
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