Dominik Metzler, Robert L. Bruce, et al.
JVSTA
Light emitted from a plasma during reactive ion etching and reflected by the wafer surface at a grazing angle is utilized to determine the remaining film thickness with an accuracy of ±30 Å. This promises a more flexible etching approach, e.g., tailoring the final stage of etching to minimize lattice damage.
Dominik Metzler, Robert L. Bruce, et al.
JVSTA
David Vender, Gottlieb S. Oehrlein, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Tim D. Bestwick, Gottlieb S. Oehrlein
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Ying Zhang, Gottlieb S. Oehrlein, et al.
Journal of Applied Physics