Growth and structural characterization of highly oriented sputter-deposited (111), (110), and (100) Co/Cu superlattices

Abstract

Highly oriented, sputter-deposited (111), (110), and (100) Co/Cu superlattices have been grown simultaneously on substrates of Al2O3 (sapphire), MgO (110), and (100), respectively, using thin seed layers of Pt or Pd deposited at ∼500 °C. High-resolution electron microscopy and x-ray scattering demonstrate that the films are epitaxial and of excellent crystallinity. © 1997 American Institute of Physics.