Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Photoluminescence and resonant Raman scattering have been studied in GaAs under hydrostatic stress up to 72 kbar. From the pressure dependence of the photoluminescence intensity the pressure coefficient of the X6 conduction band minimum in GaAs has been determined. The pressure dependence of zone edge phonon energies in GaAs is also reported. © 1978.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
David B. Mitzi
Journal of Materials Chemistry
Lawrence Suchow, Norman R. Stemple
JES
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008