Zohar Feldman, Avishai Mandelbaum
WSC 2010
No abstract available.
Zohar Feldman, Avishai Mandelbaum
WSC 2010
Michael C. McCord, Violetta Cavalli-Sforza
ACL 2007
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Frank R. Libsch, S.C. Lien
IBM J. Res. Dev