Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
In this paper, we apply She and Leveque's [Z.-S. She and E. Leveque, Phys. Rev. Lett. 72, 336 (1994)] hierarchy model under the assumption that limp→τp/p=-1 with τp being the scaling exponent for the local averaged dissipation function suggested by Novikov [E. A. Novikov, Phys. Rev. E 50, R3303 (1994)]. The resulting model agrees well with existing theoretical and experimental results for p≤10. The most interesting prediction of this model is the saturation of the exponents of the velocity increment as p→. © 1995 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Reisman, M. Berkenblit, et al.
JES
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Macromolecules
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Physical Review B