Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
We briefly review recent progress in elucidating the time-independent critical behavior of systems with infinite numbers of static absorbing states, and show that the critical exponent describing the decay with time of the order parameter right at the critical point is the same as that of the directed percolation problem.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Trang H. Tran, Lam Nguyen, et al.
INFORMS 2022
Harpreet S. Sawhney
IS&T/SPIE Electronic Imaging 1994
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007