Y.Y. Li, K.S. Leung, et al.
J Combin Optim
No abstract available.
Y.Y. Li, K.S. Leung, et al.
J Combin Optim
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Ruixiong Tian, Zhe Xiang, et al.
Qinghua Daxue Xuebao/Journal of Tsinghua University
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009