Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
We report the first measurement of local structure in the thin layers of a semiconductor superlattice using the extended x-ray absorption fine structure. The measured values of interatomic distance and Debye-Waller factor in InAs offer a direct confirmation of the structure as intended in the growth process, and set an upper limit of the lattice strain to less than 1.5%. The data also indicate an anisotropy of the electron mean-free path in the thin layers and structural disorder at distances beyond the nearest neighbors. © 1985 The American Physical Society.
Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
David B. Mitzi
Journal of Materials Chemistry
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials