Conference paper
Airborne chemical contamination of a chemically amplified resist
Scott A. MacDonald, N.J. Clecak, et al.
Microlithography 1991
We have combined the techniques of frequency-modulation spectroscopy (FMS) and photochemical-modulation spectroscopy to carry out high-resolution, high-sensitivity absorption measurements on the formyl and amino radicals. Using the (0,90, 0)-(0,01, 0) band of the Ã,2A″- {Mathematical expression},2A′ transition of HCO at 614 nm, we obtained a sensitivity limit for absorption of 1.5×10-6. Reconstructed spectra of several HCO lines are presented. © 1984 Springer-Verlag.
Scott A. MacDonald, N.J. Clecak, et al.
Microlithography 1991
C.S. Burton, H.E. Hunziker
Chemical Physics Letters
H.R. Wendt, H.E. Hunziker
The Journal of Chemical Physics
M. DeVries, H.E. Hunziker, et al.
Proceedings of SPIE 1989