Paper
X‐ray lithography
R. Feder, E. Spiller, et al.
Polymer Engineering & Science
Soft X-ray contact microscopy has been performed using a shortlived laser-produced plasma as the X-ray source. Single-shot exposures have been recorded in X-ray photoresists, for both dried and in vivo conditions using the high-power Nd: Glass and KrF excimer laser systems, available at the SERC Central Laser Facility. The short exposure times of 1 ns and 30 ns respectively allow latent images of the specimens to be recorded before the onset of radiation damage. © 1986 Taylor & Francis Group, LLC.
R. Feder, E. Spiller, et al.
Polymer Engineering & Science
R.A. McCorkle, J. Angilello, et al.
Science
D. Sayre, J. Kirz, et al.
Ultramicroscopy
R.J. Rosser, R. Feder, et al.
Journal of Microscopy