Gregory Czap, Kyungju Noh, et al.
APS Global Physics Summit 2025
Extended x-ray-absorption fine-structure measurements for 0.1, 0.7, and 7 at.% arsenic impurities in single-crystal silicon yield As-to-Si nearest-neighbor distances of 2.41 ± 0.02, which are 0.06 (2.5%) greater than the Si-to-Si distance in pure silicon. Next-nearest-neighbor distances are 3.85 ± 0.02, only 0.01 (0.3%) greater than the corresponding Si-to-Si distance. © 1986 The American Physical Society.
Gregory Czap, Kyungju Noh, et al.
APS Global Physics Summit 2025
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics