Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A proposed theory of liquid electrophotographic development explicitly accounts for the presence of excess ions. The theory shows that the maximum development possible is decreased from the neutralization limit by the ratio of the toner conductivity to the total conductivity. Three independent techniques are proposed to determine this ratio. It is found to be about 0.2 for a commercially available liquid developer.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
M.J. Slattery, Joan L. Mitchell
IBM J. Res. Dev
Reena Elangovan, Shubham Jain, et al.
ACM TODAES
Thomas M. Cheng
IT Professional